Yoshihiko Takano

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Organization: National Institute for Materials Science , Japan
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Title: (PhD)
Co-reporter:Y. Takano, T. Takenouchi, S. Ishii, S. Ueda, T. Okutsu, I. Sakaguchi, H. Umezawa, H. Kawarada, M. Tachiki
Diamond and Related Materials 2007 Volume 16(4–7) pp:911-914
Publication Date(Web):April–July 2007
DOI:10.1016/j.diamond.2007.01.027
Superconductivity was achieved above 10 K in heavily boron-doped diamond thin films deposited by the microwave plasma-assisted chemical vapor deposition (CVD) method. Advantages of the CVD method are the controllability of boron concentration in a wide range, and a high boron concentration, compared to those obtained using the high-pressure high-temperature method. The superconducting transition temperatures of homoepitaxial (111) films are determined to be 11.4 K for TC onset and 8.4 K for zero resistance from transport measurements. In contrast, the superconducting transition temperatures of (100) films TC onset = 6.3 K and TC zero = 3.2 K were significantly suppressed.
Co-reporter:Yoshihiko Takano, Masanori Nagao, Tomohiro Takenouchi, Hitoshi Umezawa, Isao Sakaguchi, Masashi Tachiki, Hiroshi Kawarada
Diamond and Related Materials 2005 Volume 14(11–12) pp:1936-1938
Publication Date(Web):November–December 2005
DOI:10.1016/j.diamond.2005.08.014
Superconductivity was discovered in heavily boron-doped diamond thin films deposited by the microwave plasma assisted chemical vapor deposition (MPCVD) method. Advantages of the MPCVD deposited diamond are the controllability of boron concentration in a wide range, and a high boron concentration, especially in (111) oriented films, compared to that of the high-pressure high-temperature method. The superconducting transition temperatures are determined to be 8.7 K for Tc onset and 5.0 K for zero resistance by transport measurements. And the upper critical field is estimated to be around 7 T.
Ethanol, 2-[2-(2-methoxyethoxy)ethoxy]-, 1-(4-methylbenzenesulfonate)
Benzene,1,4-bis(dodecyloxy)-2,5-diiodo-
DIETHYL-(2-METHOXYETHYL)-METHYLAZANIUM;TETRAFLUOROBORATE
iron ditelluride