Kenji Sakamoto

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Organization: Tohoku University , Japan
Department: Research Institute of Electrical Communication
Title: (PhD)
Co-reporter:Sayaka Yanagida, Satoko Nishiyama, Kenji Sakamoto, Hiroshi Fudouzi, and Kazushi Miki
Langmuir September 26, 2017 Volume 33(Issue 38) pp:9954-9954
Publication Date(Web):August 29, 2017
DOI:10.1021/acs.langmuir.7b02788
We report a simple and facile method for fabricating monolayer colloidal films of alkanethiol-capped gold nanoparticles (AuNPs) on glass substrates. The new method consists of two sequential sonication processes. The first sonication is performed to obtain a well-dispersed state of alkanethiol-capped AuNPs in hexane/acetone in the presence of a substrate. After additional static immersion in the colloidal solution for 5 min, the substrate is subjected to sonication in hexane. By using this method, we succeeded in forming uniform and stable assemblies of midnanometer-sized AuNPs (14, 34, and 67 nm in diameter) over the entire surface of 10-mm square glass substrates in a short processing time of less than 10 min. It was also demonstrated that this method can be applied to a 1.5-in. octagonal glass substrate. The mechanism of monolayer colloidal film formation was discussed based on scanning electron microscopy observations at each preparation step. We found that the second sonication was the key process for uniform and high-surface-coverage colloidal film formation of midnanometer-sized AuNPs. The second sonication promotes the migration of AuNPs on top of the monolayer in contact with the substrate surface, decreasing both the multilayer region and the bare surface area. Eventually, a nearly perfect monolayer colloidal film is formed.
Co-reporter:Kirill Bulgarevich, Kenji SakamotoTakeo Minari, Takeshi Yasuda, Kazushi Miki
ACS Applied Materials & Interfaces 2017 Volume 9(Issue 7) pp:
Publication Date(Web):January 24, 2017
DOI:10.1021/acsami.6b15398
Surface hydrophobization by self-assembled monolayer formation is a powerful technique for improving the performance of organic field-effect transistors (OFETs). However, organic thin-film formation on such a surface by solution processing often fails due to the repellent property of the surface against common organic solvents. Here, a scalable unidirectional coating technique that can solve this problem, named self-assisted flow-coating, is reported. Producing a specially designed lyophobic–lyophilic pattern on the lyophobic surface enables organic thin-film formation in the lyophobic surface areas by flow-coating. To demonstrate the usefulness of this technique, OFET arrays with an active layer of poly(2,5-bis(3-hexadecylthiophene-2-yl)thieno[3,2-b]thiophene) are fabricated. The ideal transfer curves without hysteresis behavior are obtained for all OFETs. The average field-effect hole mobility in the saturation regime is 0.273 and 0.221 cm2·V–1·s–1 for the OFETs with the channels parallel and perpendicular to the flow-coating direction, respectively, and the device-to-device variation is less than 3% for each OFET set. Very small device-to-device variation is also obtained for the on-state current, threshold voltage, and subthreshold swing. These results indicate that the self-assisted flow-coating is a promising coating technique to form spatially uniform thin films of polymeric organic semiconductors on lyophobic gate insulator surfaces.Keywords: device-to-device variation; lyophobic−lyophilic patterns; organic field-effect transistors; polymeric organic semiconductors; self-assisted flow-coating;
Co-reporter:Kenji Sakamoto, Kiyoaki Usami, Kazushi Miki
Colloids and Surfaces B: Biointerfaces 2007 Volume 56(1–2) pp:260-264
Publication Date(Web):15 April 2007
DOI:10.1016/j.colsurfb.2006.11.033
We have investigated the molecular orientation of glassy poly(9,9-dioctylfluorenyl-2,7-diyl) (PFO) layers formed on photo-aligned polyimide films with different in-plane anisotropy. The polyimide contains azobenzene in the backbone structure (Azo-PI), allowing us to control the in-plane anisotropy of the film by varying linearly polarized light (LP-L) exposure. The glassy PFO layers (∼30 nm thick) were obtained by annealing the samples at the liquid crystalline phase of PFO and then quenching them to room temperature. The degree of alignment of PFO was assessed by the polarization ratio of photoluminescence (PL). The PL polarization ratio increased rapidly with the LP-L exposure, and it reached 10 at 2.8 J/cm2. Beyond this LP-L exposure, it became almost constant around 10.4. This PL polarization ratio was much higher than the absorption dichroic ratio of the underlying Azo-PI film. This result suggests that the degree of alignment of PFO is determined by its liquid crystalline nature. The saturation dependence of the degree of alignment is very useful for fabricating alignment patterns by a simple photo-mask exposure method. We have succeeded in fabricating 3 μm line-and-space alignment patterns of PFO.
Co-reporter:Kenji Sakamoto, Kiyoaki Usami, Toru Sasaki, Takashi Kanayama, Sukekatsu Ushioda
Thin Solid Films 2004 Volumes 464–465() pp:416-419
Publication Date(Web):October 2004
DOI:10.1016/j.tsf.2004.06.058
Using polarized infrared absorption spectroscopy, we have determined the orientation of the polyimide backbone structure in photo-alignment films for liquid crystals (LC). The polyimide used in this study contains azobenzene in the backbone structure. Photo-alignment treatment was performed on the corresponding polyamic acid film, using a light source of wavelength 340–500 nm. The polyamic acid film (∼16 nm thick) was first irradiated at normal incidence with linearly polarized light (LP-light) of 156 J/cm2, and then oblique angle irradiation of unpolarized light (UP-light) was performed in the plane of incidence perpendicular to the polarization direction of the LP-light. The UP-light exposure was varied up to 882 J/cm2. We found that the average inclination angle of the polyimide backbone structure, measured from the surface plane, increases almost linearly with UP-light exposure. On the other hand, the in-plane anisotropy induced by the first irradiation with LP-light decreases with the increase of UP-light exposure.
Poly[(5,7-dihydro-1,3,5,7-tetraoxobenzo[1,2-c:4,5-c']dipyrrole-2,6(1H,3 H)-diyl)-1,4-phenyleneazo-1,4-phenylene]
Poly[(chloro-1,4-phenylene)-1,2-ethanediyl]
[1]benzothieno[3,2-b][1]benzothiophene, 2,7-dioctyl-
POLY[AZO-1,4-PHENYLENEIMINOCARBONYL(DICARBOXYPHENYLENE)CARBONYLIMINO-1,4-PHENYLENE]
Poly(1,4-phenylene-1,2-ethanediyl)
Poly(oxy-1,2-ethanediyloxycarbonyl-2,6-naphthalenediylcarbonyl)
9-(2-carboxyphenyl)-3,6-bis(ethylamino)xanthylium chloride
Dodecanethiol (8CI,9CI)
1,2,3-Propanetricarboxylicacid, 2-hydroxy-, sodium salt (1:?)