DanNa Zhou

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Name: 周丹娜

Organization: China University of Geosciences , China

Department: Department of Chemistry

Title: Associate Professor(PhD)

TOPICS

Physical Chemistry

Organic Chemistry

Organocatalysis

Chemicals
References

Sulfur-replaced Fenton systems: can sulfate radical substitute hydroxyl radical for advanced oxidation technologies?

Co-reporter:Danna Zhou;Hui Zhang;Long Chen

Journal of Chemical Technology and Biotechnology 2015 Volume 90( Issue 5) pp:775-779

Publication Date(Web):

DOI:10.1002/jctb.4525

Abstract

Sulfate radicals (SO₄^•−) and hydroxy radicals (HO^•) are the major radicals used in advanced oxidation technologies (AOTs) for the removal of contaminants. Although SO₄^•− reacts with organic or inorganic compounds with rate constants comparatively lower than that of HO^•, AOTs based on SO₄^•− (abbreviated as SR-AOTs) have gained lots of attention due to the selective oxidation and non-pH-dependence. A series of systems using persulfate (PS) or peroxymonosulfate (PMS) instead of H₂O₂ is designated as a sulfate radical-Fenton system or sulfur-replaced Fenton system (SR-Fenton). Comparisons and analogies between Fenton (Fenton-like) systems and SR-Fenton systems are made and some new SR-AOTs systems without PS or PMS are introduced. The possibility for the substitution of HO^• by SO₄^•− for AOTs is discussed. Most likely in the future, efforts will be concentrated on product-oriented AOTs with the purpose of recovery of chemical products rather than mineralization of organic contaminants, producing greenhouse gas CO₂. Moreover, such SR-Fenton system may be more atomically economical. © 2014 Society of Chemical Industry

Photodegradation of chloromycetin in aqueous solutions: kinetics and influencing factors

Co-reporter:Danna Zhou;Wenyu Huang;Feng Wu

Reaction Kinetics, Mechanisms and Catalysis 2010 Volume 100( Issue 1) pp:45-53

Publication Date(Web):2010 June

DOI:10.1007/s11144-010-0149-3

This study of photodegradation of the antibiotic chloromycetin (Cm) in aqueous solution by direct and indirect photolysis included photolysis under UV-C light (λ = 254 nm) and photo-oxidation under UV–vis light (λ ≥ 365 nm) in the presence of iron and humic acid. The factors affecting Cm degradation were studied and are described in detail, including initial pH, ionic strength and initial concentrations of iron and humic acid. Results showed that a degradation efficiency up to 90% was achieved by direct photolysis of Cm at pH 5–7 and the calculated quantum yield was 0.084. Higher salt content (NaCl, 0.01–0.5 M) was found to benefit direct photolysis. Indirect photolysis of Cm in the presence of iron(III) formed OH• radicals at pH ~ 3. Under UV–vis light, increased pH resulted in a significant decrease in the efficiency of indirect photolysis. Direct and indirect photolysis reactions both followed a pseudo first-order kinetic law. Humic acid tended to inhibit the photodegradation of Cm under the conditions of this work, implying that photosensitization of humic acid did not play any role in the photodegradation.